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Chemical Vapor Deposition

Volumn 16, Issue 10-12, 2010, Pages 336-345

Modeling the transport and reaction mechanisms of copper oxide CVD

(5) Arana Chavez, David a Toumayan, Edward a Lora, Federico a McCaslin, Christopher a Adomaitis, Raymond A a

a UNIVERSITY OF MARYLAND (United States)

Author keywords

Copper oxide; Mathematical modeling; PEC hydrogen production; Reaction equilibrium; Response; Surface models

Indexed keywords

MATHEMATICAL MODELING; PEC HYDROGEN PRODUCTION; REACTION EQUILIBRIUM; RESPONSE; SURFACE MODELS;

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; COPPER; GAS PRODUCERS; HYDROGEN PRODUCTION; MOLECULAR WEIGHT; OXIDE FILMS; OXYGEN; PHASE INTERFACES; SOLAR POWER GENERATION; SURFACE PROPERTIES; SURFACE REACTIONS; WALLS (STRUCTURAL PARTITIONS);

MATHEMATICAL MODELS;

EID: 78650800970 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.201006873 Document Type: Article

Times cited : (15)

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