Development, optimization and evaluation of a CF4 pre-treatment process to remove unwanted interfacial layers in stacks of CVD and PECVD polycrystalline silicon-germanium for MEMS applications

ECS Transactions

Volumn 28, Issue 20, 2010, Pages 79-90

  Bryce, George ^a   Severi, Simone ^a   Van Hoof, Rita ^a   Guo, Bin ^a   Kunnen, Eddy ^a   Witvrouw, Ann ^a   Decoutere, Stefaan ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DEPOSITION; GERMANIUM OXIDES; MEMS; NANOCRYSTALLINE MATERIALS; POLYCRYSTALLINE MATERIALS; SI-GE ALLOYS; SILICON COMPOUNDS;

DEPOSITION CHAMBERS; INTERFACIAL LAYER; MECHANICAL AND ELECTRICAL PROPERTIES; MEMS APPLICATIONS; MICRO ELECTRO MECHANICAL SYSTEM; POLY-CRYSTALLINE SILICON; POLYCRYSTALLINE SILICON GERMANIUMS; PRETREATMENT PROCESS;

SILICON WAFERS;

EID: 79959503612     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3489934     Document Type: Conference Paper

References (7)

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