Fabrication of BaSi2 films on transparent CaF2(111) substrates by molecular beam epitaxy for optical characterization

Physics Procedia

Volumn 11, Issue , 2011, Pages 189-192

  Toh, K ^a   Saito, T ^a   Khan, M Ajmal ^a   Okada, A ^a   Usami, N ^b   Suemasu, T ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Molecular beam epitaxy; Optical absorption

Indexed keywords

ELECTROMAGNETIC WAVE ABSORPTION; ELECTROSTATIC DEVICES; ELECTROSTATIC DISCHARGE; EPITAXIAL GROWTH; LIGHT ABSORPTION; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; OPTOELECTRONIC DEVICES; SILICIDES; SURFACE CHEMISTRY;

CRYSTALLINE QUALITY; ELECTRON STIMULATED DESORPTION; OPTICAL CHARACTERIZATION; ROUGH SURFACES; SI FILMS; SI LAYER; TEMPLATE LAYERS;

SILICON;

EID: 79959430624     PISSN: 18753884     EISSN: 18753892     Source Type: Conference Proceeding    
DOI: 10.1016/j.phpro.2011.01.050     Document Type: Conference Paper

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