Boron surfactant enhanced growth of thin Si films on CaF2/SI

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 6, 2004, Pages 2246-2250

  Wang, C R ^a   Muller B H ^a   Buglel, E ^a   Wietler, T ^a   Bierkandt, M ^a   Hofmann, K R ^a   Zaumseil, P ^b  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

^b IHP   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; BORON; CALCIUM COMPOUNDS; CHEMICAL BONDS; CRYSTALLINE MATERIALS; DEPOSITION; EPITAXIAL GROWTH; MORPHOLOGY; OPTIMIZATION; SURFACE ACTIVE AGENTS; SURFACE CHEMISTRY; SURFACES; THERMODYNAMICS; VAPOR PRESSURE;

MONOCRYSTALLINE LAYERS; SOLID PHASE EPITAXY (SPE); SURFACE RECONSTRUCTION; THIN SILICON FILMS;

THIN FILMS;

EID: 10244249215     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1789215     Document Type: Article

References (22)

1. M. A. Olmstead, in Thin Films: Heteroepitaxial Systems, edited by A. W. K. Liu and M. Santos (World Scientific, p-Singapore, 1999), P. 211.
2. L. Friedmann and R. A. Soref, IEEE Photonics Technol. Lett. 5, 1200 (1993).
3. L. J. Schowalter and R. W. Fathauer, CRC Crit. Rev. Solid State Mater. Sci. 15, 367 (1989).
4. M. Watanabe, H. Muguruma, M. Asada, and S. Arai, Jpn. J. Appl. Phys., Part 1 29, 1803 (1990).
5. C. R. Wang, B. Müller, and K. R. Hofmann, Thin Solid Films 410, 72 (2002).
6. M. Watanabe, Y. Iketani, and M. Asada, Jpn. J. Appl. Phys., Part 2 39, L964 (2000).
7. M. Andersson, A. Iline, and F. Träger, Thin Solid Films 318, 103 (1998).
8. R. W. Fathauer, N. Lewis, E. L. Hall, and L. J. Schowalter, J. Appl. Phys. 60, 3886 (1986).
9. A. Klust, M. Grimsehl, and J. Wollschläger, Appl. Phys. Lett. 82, 4483 (2003).
10. C. R. Wang, B. H. Müller, E. Bugiel, and K. R. Hofmann, Appl. Surf. Sci. 211, 203 (2003).
11. D. Kandel and E. Kaxiras, Solid State Phys. 54, 219 (2000).
12. E. Tournié and K. H. Ploog, Thin Solid Films 231, 43 (1993).
13. J. J. de Miguel, Surf. Rev. Lett. 4, 353 (1997).
14. M. Copel, M. C. Reuter, E. Kaxiras, and R. M. Tromp, Phys. Rev. Lett. 63, 632 (1989).
15. J. Klatt, D. Krüger, E. Bugiel, and H. J. Osten, Appl. Phys. Lett. 64, 360 (1994).
16. C. C. Cho, H. Y. Liu, L. M. Magel, and J. M. Anthony, Appl. Phys. Lett. 63, 3291 (1993).
17. M. Copel, M. C. Reuter, M. Horn von Hoegen, and R. M. Tromp, Phys. Rev. B 42, 11682 (1990).
18. D. Kandel, Solid State Phys. 40, 219 (2000).
19. T. Yamamoto, M. Ikeda, K. Ezoe, K. Ishii, and S. Matsumoto, Jpn. J. Appl. Phys., Part 1 30, 4554 (2000).
20. I.-W. Lyo, E. Kaxiras, and P. Avouris, Phys. Rev. Lett. 63, 1261 (1989).
21. P. Bedrossian, R. D. Meade, K. Mortensen, D. M. Chen, J. A. Golovchenko, and D. Vanderbilt, Phys. Rev. Lett. 63, 1257 (1989).
22. P. Bedrossian, K. Mortensen, D. M. Chen, and J. A. Golovchenko, Phys. Rev. B 41, 7545 (1990).