Surface roughness of MgO thin film and its critical thickness for optimal biaxial texturing by ion-beam-assisted deposition

Journal of Applied Physics

Volumn 109, Issue 11, 2011, Pages

  Miyata, S ^a   Ibi, A ^a   Izumi, T ^a   Shiohara, Y ^a  

^a SUPERCONDUCTIVITY RESEARCH LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BIAXIAL TEXTURING; BIAXIALLY TEXTURED; CRITICAL THICKNESS; DEPOSITION CONDITIONS; DEPOSITION TIME; GRAIN ALIGNMENT; HOMOEPITAXIAL DEPOSITION; IN-PLANE; LOW TEMPERATURES; MGO THIN FILMS; SINGLE CURVES; STRONG CORRELATION; THICKNESS PROFILES; TIME EVOLUTIONS; TWO-STEP DEPOSITION;

DEPOSITION RATES; DETERIORATION; FILM THICKNESS; ION BEAM ASSISTED DEPOSITION; ION BEAMS; ION BOMBARDMENT; IONS; OPTIMIZATION; SURFACE PROPERTIES; SURFACE ROUGHNESS; THIN FILMS; VAPOR DEPOSITION;

DEPOSITION;

EID: 79959420382     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3565059     Document Type: Article

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