Fundamental aspects of ion beam assisted deposition of magnesium oxide template films

IEEE Transactions on Applied Superconductivity

Volumn 19, Issue 3, 2009, Pages 3311-3314

  Groves, James R ^a   DePaula, Raymond F ^b   Stan, Liliana ^b   Hammond, Robert H ^c   Clemens, Bruce M ^a  

^a Stanford University   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

^c STANFORD UNIVERSITY   (United States)

Author keywords

Ion beam assisted deposition; Magnesium oxide; Nucleation; Template films

Indexed keywords

GROWING FILMS; HIGH-ENERGY ELECTRON DIFFRACTION; IN-PLANE TEXTURE; IN-SITU; INFLECTION POINTS; MAGNESIUM OXIDE; MAGNESIUM OXIDES; MASS ACCUMULATIONS; MGO FILMS; NUCLEATION AND GROWTH; RECRYSTALLIZATION PROCESS; SOLID-PHASE; SURFACE COVERAGES; TEMPLATE FILMS;

AMORPHOUS FILMS; AMORPHOUS SILICON; BEAM PLASMA INTERACTIONS; ION BEAMS; ION BOMBARDMENT; IONS; MAGNESIUM; NUCLEATION; OXIDE FILMS; OXIDE MINERALS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICON NITRIDE; SUPERCONDUCTING FILMS;

ION BEAM ASSISTED DEPOSITION;

EID: 68649097249     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/TASC.2009.2018814     Document Type: Conference Paper

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