Measurement of duty cycles of metal grating masks formed on dielectric substrates

Applied Optics

Volumn 50, Issue 17, 2011, Pages 2732-2737

  Cao, Hongchao ^a   Zhou, Changhe ^a   Feng, Jijun ^a   Ma, Jianyong ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; EFFICIENCY; POLARIZATION; PROBES; SCANNING ELECTRON MICROSCOPY;

ANGLE OF INCIDENCE; DIELECTRIC SUBSTRATES; EXPERIMENTAL VERIFICATION; NONDESTRUCTIVE METHODS; SCANNING ELECTRONS; TE POLARIZATIONS; THE RIGOROUS COUPLEDWAVE ANALYSES (RCWA); TRANSMISSION EFFICIENCY;

NONDESTRUCTIVE EXAMINATION;

EID: 79958803728     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.50.002732     Document Type: Article

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