Talbot lithography: Self-imaging of complex structures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2931-2937

  Isoyan, A ^a   Jiang, F ^a   Cheng, Y C ^a   Cerrina, F ^a   Wachulak, P ^b   Urbanski, L ^b   Rocca, J ^b   Menoni, C ^b   Marconi, M ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b Engineering Research Center and Hydraulics Laboratory   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARBITRARY SHAPE; COMPLEX STRUCTURE; COST EFFECTIVE; DEGREE OF COHERENCE; DIFFRACTION LIMITED; EXTREME ULTRAVIOLETS; HE-NE LASERS; HIGH DEFINITION; HIGH QUALITY; HIGH-RESOLUTION PATTERNS; LASER SOURCES; LITHOGRAPHIC FABRICATION; MASK PATTERNING; NANOSCALE RESOLUTIONS; PERIODIC PATTERN; SELF IMAGING; SHORTER WAVELENGTH; SOFT X-RAY; TABLE-TOP; TALBOT IMAGING; WHOLE PROCESS;

DIFFRACTION; HELIUM; LIGHT; NEON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR LASERS; ULTRAVIOLET DEVICES;

PERIODIC STRUCTURES;

EID: 72849122088     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3258144     Document Type: Conference Paper

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