Arrays of nanoscale lenses for subwavelength optical lithography

Nano Letters

Volumn 10, Issue 11, 2010, Pages 4399-4404

  Jang, Jae Won ^a,b,d   Zheng, Zijian ^a,b,e   Lee, One Sun ^a,b   Shim, Wooyoung ^b,c   Zheng, Gengfeng ^a,b   Schatz, George C ^a,b   Mirkin, Chad A ^a,b,c  

^a NORTHWESTERN UNIVERSITY   (United States)

^b NORTHWESTERN UNIVERSITY   (United States)

^c Northwestern University   (United States)

^d NANOINK INC   (United States)

^e HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

Dip pen; finite element method; lens; lithography; nano; phase shift; photomask; photoresist; poly(ethylene glycol); simulation

Indexed keywords

CANTILEVER ARRAYS; DIP-PEN; DIP-PEN NANOLITHOGRAPHY; DWELL TIME; FINITE ELEMENT; NANO; NANO SCALE; OPTICAL LITHOGRAPHY; POLYMER LENS; POLYMER MOLECULAR WEIGHT; QUARTZ GLASS; QUARTZ SUBSTRATE; SIMULATION; SUB-WAVELENGTH; SUBWAVELENGTH SCALE; UV IRRADIATION;

ETHYLENE; ETHYLENE GLYCOL; FINITE ELEMENT METHOD; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; OPTICAL INSTRUMENTS; PHASE SHIFT; PHOTOMASKS; PHOTORESISTS; POLYETHYLENE GLYCOLS; POLYETHYLENE OXIDES; POLYMERS; QUARTZ;

LENSES;

MACROGOL DERIVATIVE;

ARTICLE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; METHODOLOGY; NANOTECHNOLOGY; OPTICAL INSTRUMENTATION; PARTICLE SIZE; PHOTOGRAPHY;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LENSES; NANOTECHNOLOGY; PARTICLE SIZE; PHOTOGRAPHY; POLYETHYLENE GLYCOLS;

EID: 78449295493     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl101942s     Document Type: Article

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