Growth and characterization of electrodeposited Cu(In,Al)Se2 thin films

Thin Solid Films

Volumn 519, Issue 19, 2011, Pages 6252-6257

  Prasher, Dixit ^a   Rajaram, Poolla ^a  

^a JIWAJI UNIVERSITY   (India)

Author keywords

Copper indium aluminum selenide; Electrodeposition; Optical; Scanning electron microscopy; Thin films; X ray diffraction

Indexed keywords

AL CONTENT; ANNEALED FILMS; AQUEOUS BATHS; AS-GROWN; CATHODIC ELECTRODEPOSITION; COATED GLASS; CRYSTALLINITIES; CU(IN ,AL)SE; DEPOSITION POTENTIAL; ELECTRODEPOSITED FILMS; ENERGY DISPERSIVE ANALYSIS OF X-RAYS; MICRON RANGE; OPTICAL; OPTICAL BANDS; OPTICAL STUDY; POTENTIAL RANGE; SATURATED CALOMEL ELECTRODE; SCANNING ELECTRONS; SEM STUDY; SINGLE PHASE; UV-VIS-NIR SPECTROSCOPY; XRD;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; DEPOSITION; DIFFRACTION; ELECTRODEPOSITION; NEAR INFRARED SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SELENIUM COMPOUNDS; SEMICONDUCTING SELENIUM COMPOUNDS; SHEET MOLDING COMPOUNDS; STOICHIOMETRY; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ALUMINUM;

EID: 79958190499     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.03.126     Document Type: Article

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