Oxygen vacancy in Al2O3: Photoluminescence study and first-principle simulation

Thin Solid Films

Volumn 519, Issue 19, 2011, Pages 6319-6322

  Pustovarov, V A ^a   Perevalov, T V ^b   Gritsenko, V A ^b   Smirnova, T P ^c   Yelisseyev, A P ^d  

^a URAL FEDERAL UNIVERSITY   (Russian Federation)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^c NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^d TROFIMUK INSTITUTE OF PETROLEUM GEOLOGY AND GEOPHYSICS   (Russian Federation)

Author keywords

Alumina; Chemical vapor deposition; Density functional theory; Photoluminescence; Simulation; Thin films

Indexed keywords

CHEMICAL VAPOR; DIVACANCIES; EXTINCTION SPECTRA; FIRST PRINCIPLE SIMULATION; FIRST-PRINCIPLES; NEUTRAL OXYGEN VACANCY; PHOTOLUMINESCENCE BANDS; PL BANDS; QUANTUM-CHEMICAL SIMULATIONS; SIMULATION; SINGLE VACANCIES;

ALUMINUM; AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DENSITY FUNCTIONAL THEORY; OXYGEN; PHOTOLUMINESCENCE; QUANTUM CHEMISTRY;

OXYGEN VACANCIES;

EID: 79958182355     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.014     Document Type: Article

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