Quantitative analysis of electrodeposited tin film morphologies by atomic force microscopy

Thin Solid Films

Volumn 471, Issue 1-2, 2005, Pages 76-85

  Jiang, T ^a   Hall, N ^a   Ho, A ^a   Morin, S ^a  

^a YORK UNIVERSITY   (Canada)

Author keywords

Atomic force microscopy (AFM); Electrochemistry; Surface morphology; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURRENT DENSITY; ELECTROCHEMISTRY; ELECTRODEPOSITION; ELECTROLYTES; FILM GROWTH; FLUORESCENCE; GRAIN SIZE AND SHAPE; MORPHOLOGY; STEEL; SURFACE ROUGHNESS; THICKNESS MEASUREMENT; TIN;

FILM MORPHOLOGY; GRAIN SIZE DISTRIBUTION (GSD); POWER SPECTRAL DENSITY (PSD); SCANNING PROBE MICROSCOPY (SPM);

THIN FILMS;

EID: 10644256715     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.04.051     Document Type: Article

References (17)

1. Y. Zhang, J.A. Abys, in: M. Schlesinger, M. Paunovic (Eds.), Modem Electroplating, 4th ed., The Electrochemical Society Series, Wiley, New York, 2000, p. 241.
2. A.A. Gewirth, B.K. Niece, Chem. Rev. 97 (1997) 1129.
3. W.U. Schmidt, R.C. Alkire, A.A. Gewirth, J. Electrochem. Soc. 143 (1996) 3122.
4. R.C. Salvarezza, A.J. Arvia, in: W.J. Lorenz, W. Plieth (Eds.), Electrochemical Nanotechnology, Wiley, Weinheim, Germany, 1998, pp. 57-71.
5. S. Mendez, G. Andreasen, P. Schilardi, M. Figueroa, L. Vazquez, R.C. Salvarezza, A.J. Arvia, Langmuir 14 (1998) 2515.
6. D.M. Kolb, Electrochim. Acta 45 (2000) 2387.
7. O.M. Magnussen, F.A. Moller, A. Lachenwitzer, R.J. Behm, Electrochemical Synthesis and Modification of Materials, Materials Research Society Symposium Proceedings, vol. 451, 1997, p. 43.
8. G. Szymanski, M. Dymarska, T. Zhao, J. Lipkowski, Electrometallurgy 2001, Proceedings of 31st Annual Hydrometallurgy Meeting, August 26-29, Canadian Institute of Mining, Metallurgy and Petroleum (CIM), Toronto, ON, Canada, 2001, p. 375.
9. R.H. Zimmerman, Adv. X-ray Anal. 4 (1961) 335.
10. M. Louie, R. Christy, Thin Solid Films 134 (1987) 291.
11. J.M. Bennett, L. Mattson, Introduction to Surface Roughness and Scattering, Optical Society of America, Washington, DC, 1989.
12. S.J. Fang, S. Haplepete, W. Chen, C.R. Helms, H. Edwards, J. Appl. Phys. 82 (1997) 5891.
13. C. Ruppe, A. Duparré, Thin Solid Films 288 (1996) 8.
14. J.M. Elson, J.M. Bennett, Appl. Opt. 34 (1995) 201.
15. J. Feder, Fractals, Plenum, New York, 1988.
16. T. Yoshinobu, H. Iwasaki, Jpn. J. Appl. Phys. 32 (1993) L1562 (and references therein).
17. A.-L. Barabási, H.E. Stanley, Fractal Concepts in Surface Growth, Cambridge Univ. Press, Cambridge, 1995.