Performance results of laser-produced plasma test and prototype light sources for EUV lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Böwering, Norbert R ^a   Fomenkov, Igor V ^a   Brandt, David C ^a   Bykanov, Alexander N ^a   Ershov, Alex I ^a   Partlo, William N ^a   Myers, David W ^a   Farrar, Nigel R ^a   Vaschenko, Georgiy O ^a   Khodykin, Oleh V ^a   Hoffman, Jerzy R ^a   Chrobak, Christopher P ^a   Srivastava, Shailendra N ^a   Ahmad, Imtiaz ^a   Rajyaguru, Chirag ^a   Golich, Daniel ^a   Vidusek, David A ^a   De Dea, Silvia ^a   Hou, Richard R ^a  

^a CYMER INC   (United States)

Author keywords

Collector; EUV lithography; EUV source; Laser produced plasma (LPP); Plasma

Indexed keywords

DEBRIS; IONS; LASER PRODUCED PLASMAS; LASERS; LIGHT; LIGHT TRANSMISSION; LITHOGRAPHY; PLASMA DIAGNOSTICS; RADIATION PROTECTION; TIN; ULTRAVIOLET DEVICES; ULTRAVIOLET SPECTROSCOPY;

COLLECTOR; DEBRIS PROTECTION; DEVELOPMENT RESULTS; DUTY CYCLES; EUV IMAGES; EUV LIGHT SOURCES; EUV LITHOGRAPHY; EUV SOURCE; EXTREME ULTRAVIOLET LIGHT SOURCES; FAR-FIELD; FARADAY CUPS; FULL INTEGRATION; HIGH REPETITION RATE; HIGH-POWER; INDIVIDUAL ION; ION ENERGY ANALYZER; LASER ARCHITECTURE; LASER-PRODUCED PLASMA (LPP); LASER-PRODUCED PLASMA SOURCES; LIGHT COLLECTION; NEXT GENERATION LITHOGRAPHY; OUT-OF-BAND; OUTPUT PERFORMANCE; OUTPUT POWER; PILOT LINE; POWER LEVELS; SYSTEM OPERATION; TIN DROPLETS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 70349934903     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3224942     Document Type: Article

References (8)

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