Overlay progress in EUV lithography towards adoption for manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Hermans, Jan V ^a   Laidler, David ^a   Pigneret, Charles ^b   Van Dijk, Andre ^b   Voznyi, Oleg ^b   Dusa, Mircea ^b   Hendrickx, Eric ^a  

^a IMEC   (Belgium)

^b ASML   (Netherlands)

Author keywords

distortion; electrostatic chuck; EUV; exposure tool; flatness; overlay; thermal; vacuum

Indexed keywords

DISTORTION; ELECTROSTATIC CHUCK; EUV; EXPOSURE TOOL; FLATNESS; OVERLAY; THERMAL;

CHUCKS; ELECTROSTATICS; EXPOSURE METERS; LIGHT TRANSMISSION; MASKS; OPTICAL INSTRUMENTS; OPTICAL SYSTEMS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; VACUUM;

MANUFACTURE;

EID: 79957933512     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881088     Document Type: Conference Paper

References (11)

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