Control of wettability of hydrogenated amorphous carbon thin films by laser-assisted micro- and nanostructuring

Applied Surface Science

Volumn 257, Issue 18, 2011, Pages 7907-7912

  Pfleging, Wilhelm ^a   Kohler, Robert ^a   Torge, Maika ^a   Trouillet, Vanessa ^a   Danneil, Friederike ^a   Stüber, Michael ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Amorphous carbon; Laser ablation; Modification; Surface energy; Thin films

Indexed keywords

ABLATION; AMORPHOUS CARBON; AMORPHOUS FILMS; AMORPHOUS SILICON; CHEMICAL MODIFICATION; DEPOSITION; HYDROGEN; INTERFACIAL ENERGY; LASER ABLATION; LASER CHEMISTRY; LASER MATERIALS PROCESSING; SILICON WAFERS; SURFACE TREATMENT; THIN FILMS; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON LAYER; AMORPHOUS CARBON THIN FILMS; CHEMICAL SURFACE MODIFICATION; DIRECT CURRENT MAGNETRON SPUTTERING; HYDROGENATED AMORPHOUS CARBON; LASER MATERIAL PROCESSING; MODIFICATION; SURFACE FUNCTIONALIZATION;

CARBON FILMS;

EID: 79957890121     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.02.126     Document Type: Article

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