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Volumn 519, Issue 15, 2011, Pages 4969-4973
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Properties of polyimide/Al2O3 and Si 3N4 deposited thin films
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Author keywords
Polyimide Al2O3 hybrid; RF magnetron sputtering; Silicon nitride; Water vapor transmission rate
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Indexed keywords
BARRIER FILMS;
DENSER STRUCTURE;
GAS BARRIER;
HYBRID FILM;
INTERFACE BONDING;
PI FILM;
RF MAGNETRON SPUTTERING;
ROOT MEAN SQUARE (RMS) SURFACE ROUGHNESS;
SPUTTERING PRESSURES;
THERMAL STABILITY;
TWO-STEP REACTIONS;
WATER VAPOR TRANSMISSION RATE;
XPS;
ALUMINUM;
COMPOSITE FILMS;
MAGNETRON SPUTTERING;
MECHANICAL PROPERTIES;
NANOCOMPOSITES;
PHASE INTERFACES;
POLYIMIDES;
SILICON;
SILICON NITRIDE;
SURFACE ROUGHNESS;
WATER VAPOR;
GAS PERMEABLE MEMBRANES;
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EID: 79957649091
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2011.01.063 Document Type: Conference Paper |
Times cited : (40)
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References (21)
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