메뉴 건너뛰기




Volumn 519, Issue 15, 2011, Pages 4969-4973

Properties of polyimide/Al2O3 and Si 3N4 deposited thin films

Author keywords

Polyimide Al2O3 hybrid; RF magnetron sputtering; Silicon nitride; Water vapor transmission rate

Indexed keywords

BARRIER FILMS; DENSER STRUCTURE; GAS BARRIER; HYBRID FILM; INTERFACE BONDING; PI FILM; RF MAGNETRON SPUTTERING; ROOT MEAN SQUARE (RMS) SURFACE ROUGHNESS; SPUTTERING PRESSURES; THERMAL STABILITY; TWO-STEP REACTIONS; WATER VAPOR TRANSMISSION RATE; XPS;

EID: 79957649091     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.063     Document Type: Conference Paper
Times cited : (40)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.