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Journal of Applied Polymer Science

Volumn 116, Issue 1, 2010, Pages 245-251

Deposition of silicon oxide hard coatings by low-temperature radio-frequency plasmas

(2) Huang, Chun a Yu, Qingsong b

a YUAN ZE UNIVERSITY (Taiwan)

b University of Missouri (United States)

Author keywords

Coatings; Films; Plasma polymerization; Polycarbonates

Indexed keywords

ATTENUATED TOTAL REFLECTIONS; COATING UNIFORMITY; COMMON PROBLEMS; FOURIER TRANSFORM INFRARED; INTERFACIAL ADHESIONS; LOW TEMPERATURES; PENCIL HARDNESS TEST; PLASMA COATING; PLASMA GAS; PLASMA POLYMERS; POLYMERIC SUBSTRATE; RADIO FREQUENCY PLASMA; RF-POWER; SUBSTRATE SIZES; TRANSMISSION SPECTRUMS; ULTRA-THIN; ULTRA-VIOLET; VISIBLE LIGHT REGION;

CARBONATES; DEPOSITION; HARDNESS; HARDNESS TESTING; INORGANIC COATINGS; LIGHT TRANSMISSION; OXYGEN; PLASMA DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; POLYCARBONATES; PROTECTIVE COATINGS; SILICON COMPOUNDS; SILICON OXIDES; SUBSTRATES;

HARD COATINGS;

ADHESION; COATINGS; INTERFACIAL PROPERTY; OXYGEN; POLYCARBONATE; RADIO FREQUENCY; SILICON DIOXIDE; SUBSTRATE;

EID: 75449119477 PISSN: 00218995 EISSN: 10974628 Source Type: Journal
DOI: 10.1002/app.31440 Document Type: Article

Times cited : (19)

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