Engineering photonic Nanojets

Optics Express

Volumn 19, Issue 11, 2011, Pages 10206-10220

  Kim, Myun Sik ^a   Scharf, Toralf ^a   Mühlig, Stefan ^b   Rockstuhl, Carsten ^b   Herzig, Hans Peter ^a  

^a EPFL   (Switzerland)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLITUDE DISTRIBUTIONS; DIELECTRIC MICROSPHERES; HIGH RESOLUTION; ILLUMINATION CONDITIONS; INTERFERENCE MICROSCOPES; LOCALIZED WAVES; PHOTONIC NANOJETS;

ARTICLE; CRYSTALLIZATION; ENGINEERING; EQUIPMENT DESIGN; HOLOGRAPHY; LASER; LIGHT; MATERIALS TESTING; METHODOLOGY; NORMAL DISTRIBUTION; OPTICS; PHASE CONTRAST MICROSCOPY; PHOTON; THREE DIMENSIONAL IMAGING;

CRYSTALLIZATION; ENGINEERING; EQUIPMENT DESIGN; HOLOGRAPHY; IMAGING, THREE-DIMENSIONAL; LASERS; LIGHT; MATERIALS TESTING; MICROSCOPY, INTERFERENCE; NORMAL DISTRIBUTION; OPTICS AND PHOTONICS; PHOTONS;

EID: 79957617936     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.010206     Document Type: Article

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