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Journal of Electroanalytical Chemistry

Volumn 657, Issue 1-2, 2011, Pages 164-171

Surface structure and electrochemical characteristics of boron-doped diamond exposed to rf N2-plasma

(4) Denisenko, A a Romanyuk, A b Kibler, L A a Kohn, E a

a UNIVERSITY OF ULM (Germany)

b UNIVERSITY OF BASEL (Switzerland)

Author keywords

Diamond electrodes; Redox reactions; Surface termination; X ray photoemission spectroscopy

Indexed keywords

BORON; CATALYST ACTIVITY; DIAMONDS; DOPING (ADDITIVES); ELECTROCHEMICAL ELECTRODES; EMISSION SPECTROSCOPY; LUMINESCENCE OF ORGANIC SOLIDS; OXYGEN; PHOTOEMISSION; PLASMA APPLICATIONS; PLASMAS; REDOX REACTIONS; SURFACE REACTIONS;

ANODIC TREATMENT; BOND STRUCTURES; BORON DOPED DIAMOND; BORON-DOPING; CATALYTIC ACTIVITY; DIAMOND ELECTRODE; DIAMOND LAYERS; ELECTROCHEMICAL CHARACTERISTICS; NITROGENATION; OXYGEN EVOLUTION; OXYGEN-TERMINATED SURFACES; PLASMA TREATMENT; PLASMA-INDUCED; SURFACE SHIELDING; SURFACE TERMINATION; X-RAY PHOTOEMISSION SPECTROSCOPY;

SURFACE STRUCTURE;

EID: 79956337248 PISSN: 15726657 EISSN: None Source Type: Journal
DOI: 10.1016/j.jelechem.2011.04.021 Document Type: Article

Times cited : (17)

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