Modeling of ta-C growth: Influence of the technological parameters

Diamond and Related Materials

Volumn 20, Issue 5-6, 2011, Pages 785-792

  Schultrich, B ^a  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

Author keywords

Deposition conditions; Diamondlike carbon; Film growth; Modeling

Indexed keywords

ANALYTICAL MODEL; ANGLE OF INCIDENCE; CARBON IONS; DEPOSITION CONDITIONS; DEPOSITION PARAMETERS; DIAMONDLIKE CARBON; ENERGY EFFECTS; ION ENERGIES; ION IMPACT; MODELING; REALISTIC SIMULATION; STRESS-INDUCED; SUBSTRATE TEMPERATURE; TECHNOLOGICAL PARAMETERS; THERMAL SPIKES;

FILM GROWTH; ION BOMBARDMENT; IONS; MATHEMATICAL MODELS;

AMORPHOUS CARBON;

EID: 79956102496     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2011.03.035     Document Type: Article

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