Fabrication and study of laser-damage-resistant transparent conductive W-doped In2O3 films

Journal of Physics D: Applied Physics

Volumn 44, Issue 21, 2011, Pages

  Wang, Haifeng ^a   Zhang, Dayong ^a   Luo, Yongquan ^a   Zhao, Xiangjie ^a   Luo, Fei ^a   Huang, Lixian ^a   Li, Yanglong ^a   Wang, Weiping ^a  

^a RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

[No Author keywords available]

Indexed keywords

1064 NM; BAND GAPS; ELECTRONIC CONDUCTIVITY; LASER ABSORPTION; LASER DAMAGE RESISTANCE; LASER INDUCED DAMAGE THRESHOLDS; LASER-INDUCED DAMAGE; LOW CARRIER DENSITY; LOW RESISTIVITY; NEAR INFRARED REGION; OPTICAL TRANSMITTANCE; POLYCRYSTALLINE; PREFERENTIAL ORIENTATION; QUARTZ GLASS SUBSTRATES; TRANSPARENT CONDUCTIVE; TRANSPARENT CONDUCTIVE OXIDE FILMS; VISIBLE RANGE;

ABLATION; GLASS LASERS; LASER ABLATION; LASER DAMAGE; LASER EXCITATION; OXIDE FILMS; QUARTZ; SUBSTRATES; TIN;

INFRARED LASERS;

EID: 79956092032     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/21/215101     Document Type: Article

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