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Volumn 80, Issue 17, 2002, Pages 3216-3218
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Maximum current in nitride-based heterostructure field-effect transistors
a a a a a b b b b |
Author keywords
[No Author keywords available]
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Indexed keywords
ALGAN;
CURRENT INCREASE;
GATE LENGTH;
GATE-LEAKAGE CURRENT;
HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS;
METAL OXIDE SEMICONDUCTOR;
MODELING RESULTS;
MOS-HFETS;
SERIES RESISTANCES;
SUBMICRON GATE;
VELOCITY SATURATION;
ELECTRIC RESISTANCE;
GALLIUM NITRIDE;
HETEROJUNCTIONS;
HIGH ELECTRON MOBILITY TRANSISTORS;
LEAKAGE CURRENTS;
TRANSISTORS;
TWO DIMENSIONAL ELECTRON GAS;
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EID: 79956049694
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1476054 Document Type: Article |
Times cited : (34)
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References (8)
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