Fine crystalline grain model for the determination of the morphology of ultrathin amorphous silicon films

Applied Physics Letters

Volumn 80, Issue 7, 2002, Pages 1159-1161

  Hazra, Sukti ^a   Sakata, Isao ^a   Yamanaka, Mitsuyuki ^a   Suzuki, Eiichi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

A-SI:H; AMORPHOUS SILICON FILM; CRYSTALLINE GRAINS; EXPERIMENTAL DATA; FINE GRAINS; HYDROGENATED AMORPHOUS SILICON (A-SI:H) FILMS; PARACRYSTALLITES; ULTRA-THIN;

AMORPHOUS FILMS; CRYSTALLITES; FILM GROWTH; GRAIN GROWTH; METALLIC FILMS; MORPHOLOGY; RAPID THERMAL ANNEALING; SILICON; SPECTROSCOPIC ELLIPSOMETRY; ULTRATHIN FILMS;

AMORPHOUS SILICON;

EID: 79956039482     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1450046     Document Type: Article

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