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Volumn 80, Issue 24, 2002, Pages 4638-4640

Forming silicon carbon nitride crystals and silicon carbon nitride nanotubes by microwave plasma-enhanced chemical vapor deposition

(3) Chang, Hui Lin a Hsu, Chih Ming a Kuo, Cheng Tzu a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYST POISON; GASEOUS SOURCE; GRAPHITE-LIKE STRUCTURES; GROWTH MECHANISMS; HEXAGONAL SHAPES; MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; SI SOURCES; SILICON CARBON NITRIDE; TUBE ENDS; TUBULAR STRUCTURES;

CARBON; CATALYST POISONING; CHEMICAL VAPOR DEPOSITION; CRYSTALS; NANOTUBES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TUBULAR STEEL STRUCTURES;

CARBON NITRIDE;

EID: 79956034624 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1487925 Document Type: Article

Times cited : (18)

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