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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 12, 2001, Pages 7018-7022

Effects of substrate pretreatments and catalyst applications on Si-C-N films and nanotube formations

(2) Chang, Hui Lin a Kuo, Cheng Tzu a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

Catalyst; Chemical etching; Field emission; Nanotube; Silicon carbon nitride

Indexed keywords

BAND STRUCTURE; CATALYSTS; CHEMICAL POLISHING; COMPOSITION EFFECTS; CURRENT DENSITY; ETCHING; MORPHOLOGY; NANOTUBES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL);

FILM DEPOSITIONS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; NANOTUBE FORMATIONS; SILICON CARBON NITRIDE; SUBSTRATE PRETREATMENTS;

SILICON COMPOUNDS;

EID: 0035714075 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.40.7018 Document Type: Article

Times cited : (1)

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