Sputtering of Si with decaborane cluster ions

Applied Physics Letters

Volumn 80, Issue 4, 2002, Pages 592-594

  Sosnowski, Marek ^a   Albano, Maria A ^a   Li, Cheng ^a   Gossmann, Hans Joachim L ^b   Jacobson, Dale C ^b  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b AGERE SYSTEMS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM ENERGIES; CLUSTER IONS; COLLECTIVE MOTIONS; COMPLEX IONS; DECABORANES; LOW ENERGIES; SHALLOW IMPLANTATION; SHALLOW JUNCTION; SPUTTERING YIELDS; SURFACE ATOMS;

ATOMS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICES; SILICON;

IONS;

EID: 79956029461     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1446211     Document Type: Article

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