Preferentially oriented vanadium nitride films deposited by magnetron sputtering

Materials Letters

Volumn 65, Issue 14, 2011, Pages 2146-2148

  Suszko, Tomasz ^a   Gulbiński, Witold ^a   Urbanowicz, Arkadiusz ^a   Gulbiński, Wojciech ^a  

^a KOSZALIN UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Hard coatings; Magnetron sputtering; Preferential orientation; Vanadium nitride

Indexed keywords

COMPOSITION EVOLUTION; INTERMEDIATE PHASIS; PREFERENTIAL ORIENTATION; PULSED MAGNETRON SPUTTERING; REDUCING-FRICTION; RESEARCH TEAMS; VANADIUM NITRIDE; VANADIUM NITRIDE FILMS; VANADIUM NITRIDES; VANADIUM OXIDES; VANADIUM TARGET; WEAR-RESISTANT COATING;

CARBIDES; COMPOSITE COATINGS; CRYSTALLITE SIZE; ENGINEERING RESEARCH; HARD COATINGS; MAGNETRON SPUTTERING; NITRIDES; VANADIUM; VANADIUM COMPOUNDS;

VANADIUM ALLOYS;

EID: 79955978494     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2011.04.038     Document Type: Article

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