Interfacial stoichiometry and adhesion at metal/α-Al 2O3 interfaces

Journal of the American Ceramic Society

Volumn 94, Issue SUPPL. 1, 2011, Pages s154-s159

  Li, Hong Tao ^a,b,c   Chen, Lian Feng ^a,b   Yuan, Xun ^a,b   Zhang, Wen Qing ^a   Smith, John R ^d   Evans, Anthony G ^e  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^c Entry Exit Inspection and Quarantine Bureau   (China)

^d UNIVERSITY OF MICHIGAN   (United States)

^e NONE

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ADHESIVES; MOLAR RATIO; STOICHIOMETRY;

ADHESIVE BONDING; COVALENT COMPONENTS; FIRST-PRINCIPLES STUDY; INTERFACIAL ADHESIONS; METAL OXIDE INTERFACE; METALLIC COMPONENT; STRONG CORRELATION; UNIFIED MODELING;

METALS;

EID: 79955896420     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2011.04405.x     Document Type: Article

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