IMAGINE: An open consortium to boost Maskless lithography take off first assessment results on MAPPER technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7970, Issue , 2011, Pages

  Pain, L ^a   Icard, B ^a   Martin, M ^a   Constancias, C ^a   Tedesco, S ^a   Wiedeman, P ^b   Farah, A ^b   Kampherbeek, B J ^b   Pieczulewski, C ^c   Kandrashov, H ^d  

^a CEA LETI   (France)

^b MAPPER Lithography BV   (Netherlands)

^c Sokudo Co Ltd   (Japan)

^d DAINIPPON SCREEN MFG CO LTD   (Japan)

Author keywords

Lithography; Low energy; Mask less; Multi beam; Photoresist

Indexed keywords

ACCELERATING VOLTAGES; COLLABORATIVE PROGRAMS; IC MANUFACTURERS; INDUSTRY NEEDS; INFRASTRUCTURE DEVELOPMENT; LOW ENERGIES; MAPPER TECHNOLOGY; MASK LESS; MASK-LESS LITHOGRAPHY; MULTI-BEAM; RESOLUTION CAPABILITY; ROADMAP; STMICROELECTRONICS; TECHNOLOGY NODES;

PHOTORESISTS; RATING; TECHNOLOGY;

LITHOGRAPHY;

EID: 79955888687     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881286     Document Type: Conference Paper

References (4)

1. B. J. Lin, Proc. SPIE 6520, pp. 1-18, 2007.
2. C. Klein, Proc. SPIE 6921, 2008.
3. V. Kuiper et al, Proc. SPIE, Vol 7470, 2009
4. J. Belledent et al, Proc. SPIE, Vol 7970, to be published 2011