Construct hierarchical superhydrophobic silicon surfaces by chemical etching

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 3, 2011, Pages 2292-2297

  Zhou, Yanbiao ^a   He, Bin ^b   Yang, Yang ^b   Wang, Fang ^a   Liu, Weimin ^a   Wang, Pengfei ^a   Zhang, Wenjun ^b   Bello, Igor ^b   Lee, Shuit Tong ^b  

^a TECHNICAL INSTITUTE OF PHYSICS AND CHEMISTRY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Chemical etchinig; Hierarchical structure; Silicon nanowire array; Superhydrophobic

Indexed keywords

APPARENT CONTACT ANGLE; CHEMICAL ETCHING; ETCHING CONDITION; ETCHING TIME; HIERARCHICAL STRUCTURE; HIERARCHICAL STRUCTURES; MATERIAL MODIFICATIONS; NANOSTRUCTURED SURFACE; OPTIMIZED ETCHING; SI SURFACES; SILICON NANOWIRE ARRAY; SILICON NANOWIRE ARRAYS; SILICON SURFACES; SIMPLE APPROACH; SLIDING ANGLE; STATIC AND DYNAMIC; SUPER-HYDROPHOBIC SURFACES; SUPERHYDROPHOBIC; SURFACE TOPOLOGY; WETTING PROPERTY;

CONTACT ANGLE; ETCHING; HYDROPHOBICITY; SEMICONDUCTING SILICON;

WETTING;

NANOMATERIAL; SILICON; SOLVENT;

ARTICLE; CHEMICAL MODEL; CHEMICAL PHENOMENA; CHEMICAL STRUCTURE; CHEMISTRY; COMPUTER SIMULATION; ULTRASTRUCTURE;

COMPUTER SIMULATION; HYDROPHOBIC AND HYDROPHILIC INTERACTIONS; MODELS, CHEMICAL; MODELS, MOLECULAR; NANOSTRUCTURES; SILICON; SOLVENTS;

EID: 79955803112     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.3559     Document Type: Conference Paper

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