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Applied Physics Letters

Volumn 98, Issue 17, 2011, Pages

Atomistic approach to alloy scattering in Si1-xGex

(3) Mehrotra, Saumitra R a Paul, Abhijeet a Klimeck, Gerhard a

a Purdue University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY SCATTERING; ATOMISTIC APPROACH; BULK ALLOYS; COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; FITTING PARAMETERS; P-TYPE; SCATTERING MODEL; SI-GE ALLOYS; SIGE CHANNELS; STRAINED LAYERS; THEORETICAL MODELS; TIGHT BINDING;

GERMANIUM; SCATTERING; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE;

SILICON ALLOYS;

EID: 79955679842 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3583983 Document Type: Article

Times cited : (27)

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