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Volumn 24, Issue 2, 2011, Pages 273-279

Feedforward run-to-run control for reduced parametric transistor variation in CMOS logic 0.13 μ m technology

Author keywords

Advanced process control (APC); feedforward control; high mix fab; PLS based statistical analysis

Indexed keywords

ADVANCED PROCESS CONTROL; CMOS LOGIC; CONTROLLER ROBUSTNESS; CRITICAL DIMENSION; DEVICE PERFORMANCE; FEED-FORWARD; FEED-FORWARD CONTROLLERS; HIGH-MIX FAB; M-TECHNOLOGIES; NOVEL TECHNIQUES; PLS-BASED STATISTICAL ANALYSIS; RUN-TO-RUN CONTROL; SCATTEROMETRY; TRANSISTOR PERFORMANCE; TRANSISTOR VARIATION;

EID: 79955673242     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2011.2120910     Document Type: Conference Paper
Times cited : (7)

References (13)
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    • (2004) Proc. SPIE , vol.5375 , pp. 550-563
    • Sendelbach, M.1    Archie, C.N.2    Banke, B.3    Mayer, J.4    Nii, H.5    Herrera, P.6    Hankinson, M.7
  • 8
    • 33947115037 scopus 로고    scopus 로고
    • Evaluation of producer's and consumer's risks in scatterometry and scanning electron microscopy metrology for inline critical dimension metrology
    • M. Asano, T. Ikeda, T. Koike, and H. Abe, "Evaluation of producer's and consumer's risks in scatterometry and scanning electron microscopy metrology for inline critical dimension metrology", J. Microlithography Microfab. Microsyst., vol. 5, no. 4, pp. 043006-1-043006-14, 2006.
    • (2006) J. Microlithography Microfab. Microsyst. , vol.5 , Issue.4 , pp. 0430061-04300614
    • Asano, M.1    Ikeda, T.2    Koike, T.3    Abe, H.4
  • 10
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    • Statistical approach to optimizing advanced low-voltage SEM operation
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    • Apostolakis, P.J.1    Arnold, W.H.2
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    • H. J. Levinson, Principles of Lithography, 2nd ed. Bellingham, WA: SPIE Publications, Feb. 2005.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.