X-ray microdiffraction investigation of crystallinity and strain relaxation in Ge thin lines selectively grown on Si(0 0 1) substrates

Solid-State Electronics

Volumn 60, Issue 1, 2011, Pages 26-30

  Ebihara, Kouhei ^a   Kikkawa, Jun ^a   Nakamura, Yoshiaki ^a   Sakai, Akira ^a   Wang, Gang ^b   Caymax, Matty ^b   Imai, Yasuhiko ^c   Kimura, Shigeru ^c   Sakata, Osami ^c  

^a OSAKA UNIVERSITY   (Japan)

^b IMEC   (Belgium)

^c JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

Ge; Si; X ray microdiffraction

Indexed keywords

CRYSTAL DOMAIN; CRYSTALLINITIES; GE; LARGE DOMAIN; SI; SI(0 0 1); SIDE WALLS; TILT ANGLE; X-RAY MICRODIFFRACTION;

CHEMICAL VAPOR DEPOSITION; DIFFRACTION; SILICON; SILICON COMPOUNDS; STRAIN RELAXATION; X RAY DIFFRACTION; X RAYS;

GERMANIUM;

EID: 79955523935     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2011.01.017     Document Type: Article

References (12)

1. M.V. Fischetti, and S.E. Laux J Appl Phys 80 1996 2234
2. Q. Li, S.M. Han, S.R.J. Brueck, S. Hersee, Y.-B. Jiang, and H. Xu Appl Phys Lett 83 2003 5032
3. T.A. Langdo, C.W. Leitz, M.T. Currie, and E.A. Fitzgerald Appl Phys Lett 76 2000 3700
4. E.A. Fitzgerald, Y.-H. Xie, M.L. Green, D. Brasen, A.R. Kortan, and J. Michel Appl Phys Lett 59 1991 811
5. M. Yamaguchi J Mater Res 6 1991 376
6. M. Yamaguchi, A. Yamamoto, M. Tachikawa, Y. Itoh, and M. Sugo Appl Phys Lett 53 1988 2293
7. N. El-Masry, J.C.L. Tarn, T.P. Humphreys, N. Hamaguchi, N.H. Karam, and S.M. Bedai Appl Phys Lett 51 1987 1608
8. R. Loo, G. Wang, L. Souriau, J.C. Lin, S. Takeuchi, G. Brammertz, and M. Caymax J Electrochem Soc 157 2010 H13
9. T. Kato, Y. Nakamura, J. Kikkawa, A. Sakai, E. Toyoda, and K. Izunome Thin Solid Films 518 2010 S14
10. B.D. Cullity Elements of X-ray Diffraction 2nd ed. 1978 Addison-Wesley
11. S. Mochizuki, A. Sakai, N. Taoka, O. Nakatsuka, S. Takeda, and S. Kimura Thin Solid Films 508 2006 128
12. A. Sakai, N. Taoka, O. Nakatsuka, S. Zaima, and Y. Yasuda Appl Phys Lett 86 2005 221916