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Volumn 205, Issue 17-18, 2011, Pages 4169-4176
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Comparison of pulsed dc and rf hollow cathode depositions of Cr and CrN films
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Author keywords
Chromium (Cr); Chromium nitride (CrN); Diffuse arc deposition; Pulsed dc hollow cathode; Radio frequency hollow cathode
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Indexed keywords
ARC DEPOSITION;
CHROMIUM NITRIDE (CRN);
CHROMIUM NITRIDE FILMS;
CONSTANT POWER;
CR FILM;
FILM PROPERTIES;
HOLLOW CATHODES;
OUTLET TEMPERATURE;
POWER LEVELS;
PULSED DC;
PULSED-POWER;
RADIO FREQUENCIES;
RADIO FREQUENCY HOLLOW CATHODE;
SILICON SUBSTRATES;
CHROMIUM;
CYLINDERS (SHAPES);
DC GENERATORS;
DC POWER TRANSMISSION;
DEPOSITION;
DEPOSITION RATES;
NITRIDES;
NITROGEN PLASMA;
RADIO;
RADIO WAVES;
CATHODES;
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EID: 79955123377
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2011.03.013 Document Type: Article |
Times cited : (15)
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References (17)
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