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Volumn 205, Issue 17-18, 2011, Pages 4169-4176

Comparison of pulsed dc and rf hollow cathode depositions of Cr and CrN films

Author keywords

Chromium (Cr); Chromium nitride (CrN); Diffuse arc deposition; Pulsed dc hollow cathode; Radio frequency hollow cathode

Indexed keywords

ARC DEPOSITION; CHROMIUM NITRIDE (CRN); CHROMIUM NITRIDE FILMS; CONSTANT POWER; CR FILM; FILM PROPERTIES; HOLLOW CATHODES; OUTLET TEMPERATURE; POWER LEVELS; PULSED DC; PULSED-POWER; RADIO FREQUENCIES; RADIO FREQUENCY HOLLOW CATHODE; SILICON SUBSTRATES;

EID: 79955123377     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.03.013     Document Type: Article
Times cited : (15)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.