N-doped MgZnO alloy thin film prepared by sol-gel method

Materials Letters

Volumn 65, Issue 12, 2011, Pages 1842-1845

  Chongsri, K ^a,b   Boonruang, S ^c   Techitdheera, W ^a   Pecharapa, W ^a,b  

^a KING MONGKUT'S INSTITUTE OF TECHNOLOGY LADKRABANG   (Thailand)

^b ThEP Center   (Thailand)

^c NATIONAL ELECTRONICS AND COMPUTER TECHNOLOGY CENTER   (Thailand)

Author keywords

MgZnO; N doping; Sol gel method

Indexed keywords

ANNEALING TEMPERATURES; BLUE SHIFT; C-AXIS ORIENTATIONS; CRYSTALLINITIES; GLASS SUBSTRATES; MGZNO; MGZNO ALLOY THIN FILM; MGZNO THIN FILM; N-DOPED; N-DOPING; NITROGEN-DOPED; NITROGEN-DOPING; OPTICAL TRANSMISSION MEASUREMENTS; SCANNING ELECTRON MICROSCOPES; SEM; SOL-GEL METHOD; SOL-GEL METHODS; THERMAL ANNEALING TREATMENT; XRD;

GELS; LIGHT TRANSMISSION; NITROGEN; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SOL-GEL PROCESS; SOL-GELS; SOLS; SPIN GLASS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

OPTICAL FILMS;

EID: 79955121355     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2011.03.090     Document Type: Article

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