Atmospheric-pressure plasma synthesis of carbon nanotubes

Journal of Physics D: Applied Physics

Volumn 44, Issue 17, 2011, Pages

  Nozaki, Tomohiro ^a   Yoshida, Shinpei ^a   Karatsu, Takuya ^a   Okazaki, Ken ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE PLASMAS; ATMOSPHERIC-PRESSURE PLASMA SOURCE; CHEMICAL VAPOUR DEPOSITION; ETCHING GAS; GROWTH MECHANISMS; GROWTH PRECURSORS; GROWTH PROCESS; LOW PRESSURES; RADIO FREQUENCY DISCHARGES; REACTIVE SPECIES; THERMAL CVD; TRACE AMOUNTS;

AMORPHOUS CARBON; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; BINARY MIXTURES; CARBON NANOTUBES; ECOLOGY; ELECTRIC DISCHARGES; IONIC LIQUIDS; ISOTOPES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SHEATHS; SINGLE-WALLED CARBON NANOTUBES (SWCN); SYNTHESIS (CHEMICAL);

PLASMA DEPOSITION;

EID: 79954621851     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/17/174007     Document Type: Article

References (33)

1. Meyyappan M, Delzeit L, Cassell A and Hash D 2003 Plasma Sources Sci. Technol. 12 205
2. Meyyappan M 2009 J. Phys. D: Appl. Phys. 42 213001
3. Yoshida H, Takeda S, Uchiyama T, Kohno H and Homma Y 2008 Nano Lett. 8 2082
4. Hata K, Futaba D N, Mizuno K, Namai T, Yumura M and Iijima S 2004 Science 306 1362
5. Nozaki T, Kimura Y and Okazaki K 2002 J. Phys. D: Appl. Phys. 35 2779
6. Nozaki T, Ohnishi K, Okazaki K and Kortshagen U 2007 Carbon 45 364
7. Nozaki T and Okazaki K 2008 Plasma Process. Polym. 5 300
8. Nozaki T, Karatsu T, Ohnishi K and Okazaki K 2010 Carbon 48 232
9. Bae E J, Min Y-S, Kang D, Ko J-H and Park W 2005 Chem. Mater. 17 5141
10. Li Y et al 2004 Nano Lett. 4 317
11. Qu L, Du F and Dai L 2008 Nano Lett. 8 2682
12. Kato T, Hatakeyama R and Tohji K 2006 Nanotechnology 17 2223
13. Zhong G, Iwasaki T, Honda K, Furukawa Y, Ohdomari I and Kawarada H 2005 Japan J. Appl. Phys. Part 1 44 1558
14. Zhong G, Hofmann S, Yan F, Telg H, Warner J H, Eder D, Thomsen C, Milne W I and Robertson J 2009 J. Phys. Chem. C 113 17321
15. Kyung S-J, Lee Y-H, Kim C-W, Lee J-H and Yeom G-Y 2006 Carbon 44 1530
16. Lee K H, Jang H-S, Eom G-Y, Lee B-J, Burk D, Overzet L and Lee G S 2008 Mater. Lett. 62 3849
17. Shin S S, Choi B H, Kim Y M, Lee J H and Shin D C 2009 Microelectronic Eng. 86 925
18. Zajíkov L, Eli M, Jaek O, Kudrle V, Frgala Z, Matejkov J, Burík J and Kadleíkov M 2005 Plasma Phys. Control. Fusion 47 B655
19. Chiang W-H and Sankaran M R 2008 Adv. Mater. 20 4857
20. Chiang W-H and Sankaran M R 2009 Nature Mater. 8 882
21. Puretzky A A, Geohegan D B, Ivanov I N and Eres G 2005 Appl. Phys. A 81 223
22. Massines F, Gherardi N, Naudé N and Ségur P 2009 Eur. Phys. J. Appl. Phys. 47 22805
23. Nozaki T, Unno Y and Okazaki K 2002 Plasma Sources Sci. Technol. 11 431
24. Mangolini L, Orlov K, Kortshagen U, Heberlein J and Kogelschatz U 2002 Appl. Phys. Lett. 80 1722
25. Yuan X and Raja L L 2003 IEEE Trans. Plasma Sci. 31 495
26. Nozaki T, Karatsu T, Yoshida S and Okazaki K 2011 Japan J. Appl. Phys. 50 01AF03
27. Murakami Y, Miyauchi Y, Chiashi S and Maruyama S 2003 Chem. Phys. Lett. 377 49
28. Noda S, Hasegawa K, Sugime H, Kakehi K, Zhang Z, Maruyama S and Yamaguchi Y 2007 Japan. J. Appl. Phys. 46 L399
29. Sugime H, Noda S, Maruyama S and Yamaguchi Y 2009 Carbon 47 234
30. Xiang R, Einarsson E, Okawa J, Miyauchi Y and Maruyama S 2009 J. Phys. Chem. C 113 7511
31. Woo Y S, Jeon D Y, Han I T, Lee N S, Jung J E and Kim J M 2002 Diamond Relat. Mater. 11 59
32. Miyauchi Y and Maruyama S 2006 Phys. Rev. B 74 035415
33. Tomie T, Inoue S, Kohno M and Matsumura Y 2010 Diamond Relat. Mater. 19 1401