High-throughput characterization of Pt supported on thin film oxide material libraries applied in the oxygen reduction reaction

Analytical Chemistry

Volumn 83, Issue 6, 2011, Pages 1916-1923

  Schäfer, Dominik ^a   Mardare, Cezarina ^a   Savan, Alan ^a   Sanchez, Miguel D ^a,b   Mei, Bastian ^a   Xia, Wei ^a   Muhler, Martin ^a   Ludwig, Alfred ^a   Schuhmann, Wolfgang ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b Instituto de Física Del sur ^*  (Argentina)

Author keywords

[No Author keywords available]

Indexed keywords

AUTOMATED SCANNING; CATALYTIC ACTIVITY; CRITICAL THICKNESS; ELECTRICAL CONDUCTIVITY; ELECTROCHEMICAL ACTIVITIES; ELECTROCHEMICAL INVESTIGATIONS; EX SITU; FILM COMPOSITION; HIGH THROUGH-PUT CHARACTERIZATION; MATERIALS LIBRARIES; METAL COMPOSITION; NANO SCALE; NOMINAL THICKNESS; OXIDE LAYER; OXIDE THICKNESS; OXYGEN REDUCTION REACTION; PT FILMS; PT PARTICLE; REDUCTION CURRENT; SUBSTRATE COMPOSITION; SUBSTRATE CONDUCTIVITY; THIN FILM METAL; THIN FILM OXIDE MATERIALS; THIN WEDGE;

CATALYST ACTIVITY; CYCLIC VOLTAMMETRY; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTROLYTIC REDUCTION; FILM PREPARATION; LIBRARIES; METALLIC COMPOUNDS; NIOBIUM; OXYGEN; THIN FILM DEVICES; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

PLATINUM;

EID: 79954578103     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac102303u     Document Type: Article

References (38)

1. Potyrailo, R. A.; Mirsky, V. M. Chem. Rev. 2008, 108, 770-813.
2. Takeuchi, I.; Lauterbach, J.; Fasolka, M. J. Mater. Today 2005, 8, 18-26.
3. Xiang, X.-D. Combinatorial materials synthesis; Marcel Dekker: New York, 2003.
4. Ludwig, A.; Zarnetta, R.; Hamann, S.; Savan, A.; Thienhaus, S. Int. J. Mater. Res. 2008, 99, 1144-1149.
5. Zarnetta, R.; Takahashi, R.; Young, M. L.; Savan, A.; Furuya, Y.; Thienhaus, S.; Maass, B.; Rahim, M.; Frenzel, J.; Brunken, H.; Chu, Y. S.; Srivastava, V.; James, R. D.; Takeuchi, I.; Eggeler, G.; Ludwig, A. Adv. Funct. Mater. 2010, 20, 1917-1923.
6. Koinuma, H.; Takeuchi, I. Nat. Mater. 2004, 3, 429-438.
7. Prochaska, M.; Jin, J.; Rochefort, D.; Zhuang, L.; DiSalvo, F. J.; Abruña, H. D.; van Dover, R. B. Rev. Sci. Instrum. 2006, 77, 54104.
8. Jin, J.; Prochaska, M.; Rochefort, D.; Kim, D.; Zhuang, L.; Disalvo, F.; Vandover, R.; Abruña, H. D. Appl. Surf. Sci. 2007, 254, 653-661.
9. Woodhouse, M.; Herman, G. S.; Parkinson, B. A. Chem. Mater. 2005, 17, 4318-4324.
10. Woodhouse, M.; Parkinson, B. A. Chem. Mater. 2008, 20, 2495-2502.
11. Hassel, A. W.; Lohrengel, M. M. Electrochim. Acta 1997, 42, 3327-3333.
12. Lohrengel, M. M.; Moehring, A.; Pilaski, M. Electrochim. Acta 2001, 47, 137-141.
13. Williams, C. G.; Edwards, M. A.; Colley, A. L.; MacPherson, J. V.; Unwin, P. R. Anal. Chem. 2009, 81, 2486-2495.
14. Mardare, A. I.; Savan, A.; Ludwig, A.; Wieck, A. D.; Hassel, A. W. Corros. Sci. 2009, 51, 1519-1527.
15. Mardare, A. I.; Savan, A.; Ludwig, A.; Wieck, A. D.; Hassel, A. W. Electrochim. Acta 2009, 54, 5973-5980.
16. Mardare, A. I.; Ludwig, A.; Savan, A.; Wieck, A. D.; Hassel, A. W. Electrochim. Acta 2009, 54, 5171-5178.
17. Fernández, J. L.; Bard, A. J. Anal. Chem. 2003, 75, 2967-2974.
18. Fernández, J. L.; Hurth, C.; Bard, A. J. J. Phys. Chem. B 2005, 109, 9532-9539.
19. Sanchez-Sanchez, C. M.; Bard, A. J. Anal. Chem. 2009, 81, 8094-8100.
20. Sanchez-Sanchez, C. M.; Rodiriguez-Lopez, J.; Bard, A. J. Anal. Chem. 2008, 80, 3254-3260.
21. Fernández, J. L.; Walsh, D. A.; Bard, A. J. J. Am. Chem. Soc. 2005, 127, 357-365.
22. Eckhard, K.; Schuhmann, W. Electrochim. Acta 2007, 53, 1164- 1169.
23. Burch, R. Chem. Ind. 1988, 31, 347-372.
24. Roen, L. M.; Paik, C. H.; Jarvi, T. D. Electrochem. Solid-State Lett. 2004, 7, A19-A22.
25. Tian, J.; Sun, G.; Cai, M.; Mao, Q.; Xin, Q. J. Electrochem. Soc. 2008, 155, B187-B193.
26. Drew, K.; GirishKumar, G.; Vinodgopal, K.; Kamat, P. V. J. Phys. Chem. B 2005, 109, 11851-11857.
27. Kinoshita, K. J. Electrochem. Soc. 1990, 137, 845-848.
28. Guerin, S.; Hayden, B. E.; Pletcher, D.; Rendall, M. E.; Suchsland, J.-P. J. Comb. Chem. 2006, 8, 679-686.
29. Hayden, B. E.; Pletcher, D.; Suchsland, J.-P.; Williams, L. J. Phys. Chem. Chem. Phys. 2009, 11, 1564-1570.
30. Hayden, B. E.; Pletcher, D.; Suchsland, J.-P.; Williams, L. J. Phys. Chem. Chem. Phys. 2009, 11, 9141-9148.
31. Thienhaus, S.; Zamponi, C.; Rumpf, H.; Hattrick-Simpers, J.; Takeuchi, I.; Ludwig, A. Mater. Res. Soc. Symp. Proc. 2006, 894, 197-203.
32. Mardare, A. I.; Wieck, A. D.; Hassel, A. W. Electrochim. Acta 2007, 52, 7865-7869.
33. Hassel, A. W.; Fushimi, K.; Seo, M. Electrochem. Commun. 1999, 1, 180-183.
34. Brown, A. R. G.; Clark, D.; Eastabrook, J.; Jepson, K. S. Nature 1964, 201, 914-915.
35. Lee, C. M.; Ju, C. P.; Lin, J. H. C. J. Oral Rehabil. 2002, 29, 314- 322.
36. Maaza, M.; Sella, C.; Ambroise, J. P.; Kaabouchi, M.; Miloche, M.; Wehling, F.; Groos, M. J. Appl. Crystallogr. 1993, 26, 334-342.
37. Jiang, H.; Hirohasi, M.; Imanari, H.; Lu, Y. Scr. Mater. 2001, 45, 253-259.
38. Bartholomew, R. F.; Frankl, D. R. Phys. Rev. 1969, 187, 828- 833.