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Volumn 7, Issue 1, 2011, Pages 17-23

Invited paper: Fabrication of complexly patterned wavy structures using self-organized anisotropic wrinkling

Author keywords

confirement; patterning; thin films; waves; wrinkling

Indexed keywords

ACCUMULATED STRESS; BILAYER SYSTEMS; CONFIREMENT; CONTACT CONDITIONS; EXTERNAL CONFINEMENT; MICRO-FLUIDIC DEVICES; PATTERNED MOLDS; PATTERNING; PATTERNING APPROACHES; PERIODIC MICROSTRUCTURE; PERIODIC SPACING; RIGID SUBSTRATES; SELF-ORGANIZED; STACKED LAYER; SURFACE WRINKLING; THERMAL-ANNEALING; WAVE INTERACTIONS; WAVY STRUCTURES; WRINKLING;

EID: 79954578094     PISSN: 17388090     EISSN: 20936788     Source Type: Journal    
DOI: 10.1007/s13391-011-0303-8     Document Type: Review
Times cited : (32)

References (35)
  • 19
    • 0003583632 scopus 로고    scopus 로고
    • New York: Oxford University Press
    • J. E. Mark, Polymer Data Handbook, Oxford University Press, New York (1999).
    • (1999) Polymer Data Handbook
    • Mark, J.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.