Simple removal technology using ozone solution for chemically-stable polymer used for MEMS

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2011, Pages 324-327

  Yanagida, H ^a   Yoshida, S ^a   Esashi, M ^a   Tanaka, S ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING EFFECT; INORGANIC ADDITIVES; INORGANIC MATERIALS; ORGANIC DECOMPOSITION; ORGANIC SOLUTIONS; POLYMER ETCHING; RESIDUE ANALYSIS; SEM; STABLE POLYMERS; WATER SOLUTIONS; WET PROCESS;

ACETIC ACID; CHEMICAL STABILITY; DECOMPOSITION; MECHANICAL ENGINEERING; MECHANICS; MEMS; ORGANIC POLYMERS; OZONE; PLASMA STABILITY; POLYIMIDES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYMERS;

EID: 79953794008     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2011.5734427     Document Type: Conference Paper

References (9)

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