Interaction of hydrogen plasma with carbon-tungsten composite layer

Nuclear Engineering and Design

Volumn 241, Issue 4, 2011, Pages 1255-1260

  Vesel, Alenka ^a   Mozetic, Miran ^a   Panjan, Peter ^a   Hauptman, ^b   Klanjsek Gunde, M ^b   Balat Pichelin, Marianne ^c  

^a JO EF STEFAN INSTITUTE   (Slovenia)

^b NATIONAL INSTITUTE OF CHEMISTRY   (Slovenia)

^c Centre National de la Recherche Scientifique   (France)

Author keywords

[No Author keywords available]

Indexed keywords

GAS FLOWS; HYDROGEN PLASMA TREATMENTS; HYDROGEN PLASMAS; HYDROGENATED CARBON; MICROWAVE DISCHARGE; NEUTRAL HYDROGEN; PLASMA TREATMENT; SELECTIVE ETCHING; SEM; THICK LAYERS; TUNGSTEN COMPOSITES; XPS;

AUGER ELECTRON SPECTROSCOPY; DEPTH PROFILING; ELECTRIC DISCHARGES; HYDROGEN; IONIZATION OF GASES; PLASMA DEPOSITION; PLASMAS; SCANNING ELECTRON MICROSCOPY; TUNGSTEN; VOLTAGE DIVIDERS; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOCOMPOSITE FILMS;

EID: 79953236583     PISSN: 00295493     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nucengdes.2010.03.041     Document Type: Article

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