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One very nice example of a nanoscale surface functionalization technique is nano inkjet printing. A perspective on this technique is given in:,. 10.1021/nn700228m
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One very nice example of a nanoscale surface functionalization technique is nano inkjet printing. A perspective on this technique is given in: C. A. Mirkin, ACS Nano 1, 79 (2007). 10.1021/nn700228m
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(2007)
ACS Nano
, vol.1
, pp. 79
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-
Mirkin, C.A.1
-
2
-
-
0034612575
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Self-directed growth of molecular nanostructures on silicon
-
DOI 10.1038/35017519
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G. P. Lopinski, D. J. Moffatt, D. D. M. Wayner, and R. A. Wolkow, Nature (London) 406, 48 (2000). 10.1038/35017519 (Pubitemid 30460204)
-
(2000)
Nature
, vol.406
, Issue.6791
, pp. 48-51
-
-
Loplnski, G.P.1
Wayner, D.D.M.2
Wolkow, R.A.3
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3
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44449121816
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10.1021/jp710065t, Phys. Rev. Lett. 101, 106801 (2008); 10.1103/PhysRevLett.101.106801, Phys. Rev. B 80, 035309 (2009). 10.1103/PhysRevB.80.035309
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A. Y. Anagaw, R. A. Wolkow, and G. A. DiLabio, J. Phys. Chem. C 112, 3780 (2008); 10.1021/jp710065t P. G. Piva, R. A. Wolkow, and G. Kirczenow, Phys. Rev. Lett. 101, 106801 (2008); 10.1103/PhysRevLett.101.106801 G. Kirczenow, P. G. Piva, and R. A. Wolkow, Phys. Rev. B 80, 035309 (2009). 10.1103/PhysRevB.80. 035309
-
(2008)
J. Phys. Chem. C
, vol.112
, pp. 3780
-
-
Anagaw, A.Y.1
Wolkow, R.A.2
Dilabio, G.A.3
Piva, P.G.4
Wolkow, R.A.5
Kirczenow, G.6
Kirczenow, G.7
Piva, P.G.8
Wolkow, R.A.9
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4
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0038525489
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Patterning of Vinylferrocene on H-Si(100) via Self-Directed Growth of Molecular Lines and STM-Induced Decomposition
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DOI 10.1021/nl025628h
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Styrene line growth (Ref.) depends on radical delocalization, as does growth of lines of (a) vinyl ferrocene: P. Kruse, E. R. Johnson, G. A. DiLabio, and R. A. Wolkow, Nano Lett. 2, 807 (2002); 10.1021/nl025628h (b) benzaldehyde: J. L. Pitters, I. Dogel, G. A. DiLabio, and R. A. Wolkow, J. Phys. Chem. B 110, 2159 (2006); 10.1021/jp055153t (c) substituted butadienes: J. Zikovsky, S. A. Dogel, S. Sinha, G. A. DiLabio, and R. A. Wolkow, Chem. Phys. Lett. 458, 117 (2008); 10.1016/j.cplett.2008.04.053 (d) benzophenone and acetophenone: M. Z. Hossain, H. S. Kato, and M. Kawai, J. Am. Chem. Soc. 130, 11518 (2008); 10.1021/ja8033944 (e) phenylacetylene: M. A. Walsh, S. R. Walter, K. H. Bevan, F. M. Geiger, and M. C. Hersam, J. Am. Chem. Soc. 132, 3013 (2010). 10.1021/ja909139n (Pubitemid 135706438)
-
(2002)
Nano Letters
, vol.2
, Issue.8
, pp. 807-810
-
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Kruse, P.1
Johnson, E.R.2
DiLabio, G.A.3
Wolkow, R.A.4
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5
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10344259151
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Dispersion interactions enable the self-directed growth of linear alkane nanostructures covalently bound to silicon
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DOI 10.1021/ja0460007
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G. A. DiLabio, P. G. Piva, P. Kruse, and R. A. Wolkow, J. Am. Chem. Soc. 126, 16048 (2004). 10.1021/ja0460007 (Pubitemid 39627613)
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(2004)
Journal of the American Chemical Society
, vol.126
, Issue.49
, pp. 16048-16050
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DiLabio, G.A.1
Piva, P.G.2
Kruse, P.3
Wolkow, R.A.4
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6
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2642559387
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A self-directed growth process for creating covalently bonded molecular assemblies on the H-Si(100)-3x1 surface
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DOI 10.1021/nl049796g
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X. Tong, G. A. DiLabio, and R. A. Wolkow, Nano Lett. 4, 979 (2004). 10.1021/nl049796g (Pubitemid 38716362)
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(2004)
Nano Letters
, vol.4
, Issue.5
, pp. 979-983
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Tong, X.1
Dilabio, G.A.2
Wolkow, R.A.3
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7
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35048866306
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Selective chain reaction of acetone leading to the successive growth of mutually perpendicular molecular lines on the Si(100)-(2x1)-H surface
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DOI 10.1021/ja074464+
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M. Z. Hossain, H. S. Kato, and M. Kawai, J. Am. Chem. Soc. 129, 12304 (2007). 10.1021/ja074464+ (Pubitemid 47556866)
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(2007)
Journal of the American Chemical Society
, vol.129
, Issue.40
, pp. 12304-12309
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Hossain, Md.Z.1
Kato, H.S.2
Kawai, M.3
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8
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27544504684
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Controlled fabrication of 1D molecular lines across the dimer rows on the Si(100)-(2 × 1)-H surface through the radical chain reaction
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DOI 10.1021/ja055515a
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M. Z. Hossain, H. S. Kato, and M. Kawai, J. Am. Chem. Soc. 127, 15030 (2005). 10.1021/ja055515a (Pubitemid 41547362)
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(2005)
Journal of the American Chemical Society
, vol.127
, Issue.43
, pp. 15030-15031
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Zakir Hossain, Md.1
Kato, H.S.2
Kawai, M.3
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9
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38049181498
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10.1021/jp074389p
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J. Zikovsky, S. A. Dogel, M. B. Haider, G. A. DiLabio, and R. A. Wolkow, J. Phys. Chem. A 111, 12257 (2007). 10.1021/jp074389p
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(2007)
J. Phys. Chem. A
, vol.111
, pp. 12257
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Zikovsky, J.1
Dogel, S.A.2
Haider, M.B.3
Dilabio, G.A.4
Wolkow, R.A.5
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79953184828
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The pattern for the leads were written by electron-beam lithography in a positive photoresist consisting of 90 nm of poly(methyl methacrylate) (PMMA 950 A2) using a Raith 150 instrument. Following pattern development, a 30 nm-thick layer of Ti was deposited by sputtering. This was followed by an acetone bath lift of the residual photoresist. Subsequent heating of the sample generated titanium silicide leads.
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The pattern for the leads were written by electron-beam lithography in a positive photoresist consisting of 90 nm of poly(methyl methacrylate) (PMMA 950 A2) using a Raith 150 instrument. Following pattern development, a 30 nm-thick layer of Ti was deposited by sputtering. This was followed by an acetone bath lift of the residual photoresist. Subsequent heating of the sample generated titanium silicide leads.
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79953176482
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A high-resistivity crystal reduces the degree to which electric field lines emanating from the contacts will bend into the surface. However, if the resistivity is too high, the crystal will heat uupon application of a voltage across the leads, and so care was taken in this connection.
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A high-resistivity crystal reduces the degree to which electric field lines emanating from the contacts will bend into the surface. However, if the resistivity is too high, the crystal will heat up upon application of a voltage across the leads, and so care was taken in this connection.
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79953182162
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The three-probe (tip) UHV-STM uses two Createc SPM controllers with custom software and one Nanonis SPM controllers. Each of the tips is capable of atomic resolution. The tips can be brought in to close alignment under the view of a JEOL UHV scanning electron microscope. It is also possible to image the tips with a built-in field ion microscope.
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The three-probe (tip) UHV-STM uses two Createc SPM controllers with custom software and one Nanonis SPM controllers. Each of the tips is capable of atomic resolution. The tips can be brought in to close alignment under the view of a JEOL UHV scanning electron microscope. It is also possible to image the tips with a built-in field ion microscope.
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79953188149
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Care during heating was required because excessive annealing was found to induce segregation of the silicide leads, which resulted in loss of electrical continuity. An annealing procedure was developed in order to remove the surface contaminants and oxide and leave behind a high-quality H-Si(100) surface while preserving the electrical integrity of the leads. Typical annealing procedures involved heating samples to ca. 1100 C in several, ca. 1 second flashes.
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Care during heating was required because excessive annealing was found to induce segregation of the silicide leads, which resulted in loss of electrical continuity. An annealing procedure was developed in order to remove the surface contaminants and oxide and leave behind a high-quality H-Si(100) surface while preserving the electrical integrity of the leads. Typical annealing procedures involved heating samples to ca. 1100 C in several, ca. 1 second flashes.
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79953181811
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See supplementary material at E-JCPSA6-134-034109 for current-voltage curves obtained by contacting the leads with the STM tips; the details of this exploratory work; a sample input file demonstrating the use of DCPs; and a post-dose image of the area shown in Fig..
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See supplementary material at http://dx.doi.org/10.1063/1.3562367 E-JCPSA6-134-034109 for current-voltage curves obtained by contacting the leads with the STM tips; the details of this exploratory work; a sample input file demonstrating the use of DCPs; and a post-dose image of the area shown in Fig..
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79953166254
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note
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3.
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0001652762
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Development and assessment of new exchange-correlation functionals
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DOI 10.1063/1.477267, PII S0021960698309381
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F. A. Hamprecht, A. J. Cohen, D. J. Tozer, and N. C. Handy, J. Chem. Phys. 109, 6264 (1998). 10.1063/1.477267 (Pubitemid 128674334)
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(1998)
Journal of Chemical Physics
, vol.109
, Issue.15
, pp. 6264-6271
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Hamprecht, F.A.1
Cohen, A.J.2
Tozer, D.J.3
Handy, N.C.4
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79953195714
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Using the B971 functional (Ref.) with dispersion-correcting potentials (DCPs) (Ref.) to incorporate the effects on non-covalent interactions, we optimized the structure of the addition radical on a cluster representing the H-Si(100)-21 surface. The cluster was composed 71 silicon atoms arranged in two rows of four dimers. The Si-Si back bonds that were severed to construct the cluster were capped by H atoms whose positions were frozen during optimizations. See the SI for images of the optimized structures. In Ref. 19c, we designed Si DCPs for use with 6-31G(d,p) basis sets. However, for the present work, we used a 6-31G(d) basis set for Si in order to improve the speed of the calculations. Details are presented in the SI. All calculations were performed with the GAUSSIAN-03 PROGRAM (Ref.).
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Using the B971 functional (Ref.) with dispersion-correcting potentials (DCPs) (Ref.) to incorporate the effects on non-covalent interactions, we optimized the structure of the addition radical on a cluster representing the H-Si(100)-21 surface. The cluster was composed 71 silicon atoms arranged in two rows of four dimers. The Si-Si back bonds that were severed to construct the cluster were capped by H atoms whose positions were frozen during optimizations. See the SI for images of the optimized structures. In Ref. 19c, we designed Si DCPs for use with 6-31G(d,p) basis sets. However, for the present work, we used a 6-31G(d) basis set for Si in order to improve the speed of the calculations. Details are presented in the SI. All calculations were performed with the GAUSSIAN-03 PROGRAM (Ref.).
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Dispersion-correcting potentials were developed in: (a), (); 10.1016/j.cplett.2008.02.110 (b), J. Phys. Chem. A 112, 10968 (2008); 10.1021/jp806162t (c), J. Phys. Chem. C 113, 5681 (2009) 10.1021/jp8105056; see (Ref.).
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Dispersion-correcting potentials were developed in: (a) G. A. DiLabio, Chem. Phys. Lett. 455, 348 (2008); 10.1016/j.cplett.2008.02.110 (b) I. D. Mackie and G. A. DiLabio, J. Phys. Chem. A 112, 10968 (2008); 10.1021/jp806162t (c) E. R. Johnson and G. A. DiLabio, J. Phys. Chem. C 113, 5681 (2009) 10.1021/jp8105056; see (Ref.).
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(2008)
Chem. Phys. Lett.
, vol.455
, pp. 348
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Dilabio, G.A.1
MacKie, I.D.2
Dilabio, G.A.3
Johnson, E.R.4
Dilabio, G.A.5
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34547697784
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Gaussian, Inc., Wallingford, CT,; see (Ref.).
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M. J. Frisch, G. W. Trucks, H. B. Schlegel, GAUSSIAN03, Revision D.01, Gaussian, Inc., Wallingford, CT, 2003; see (Ref.).
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(2003)
GAUSSIAN03, Revision D.01
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Frisch, M.J.1
Trucks, G.W.2
Schlegel, H.B.3
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79953167678
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We have previously shown that styrene physisorbs to H-Si(100)-21 with a (calculated) binding energy of 7.75 kcalmol and has a diffusion distance that is ca. 110 nm (ca. one-third of the TiSi lead separation) at room temperature (Ref.).
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We have previously shown that styrene physisorbs to H-Si(100)-21 with a (calculated) binding energy of 7.75 kcalmol and has a diffusion distance that is ca. 110 nm (ca. one-third of the TiSi lead separation) at room temperature (Ref.).
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