Preparation and properties of ZnO:Mo thin films deposited by RF magnetron sputtering

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7995, Issue , 2011, Pages

  Ma, Jianhua ^a,b   Liang, Yan ^b   Zhu, Xiaojing ^a   Jiang, Jinchun ^b   Wang, Shanli ^b   Yao, Niangjuan ^b   Chu, Junhao ^a,b  

^a SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

^b Shanghai Center for Photovoltaics   (China)

Author keywords

Electrical and optical properties; Magnetron sputtering; ZnO:Mo (MZO) thin film

Indexed keywords

BAND GAPS; CRYSTALLINITIES; DOPED ZNO; ELECTRICAL AND OPTICAL PROPERTIES; FOUR-PROBE TECHNIQUES; HALL MEASUREMENTS; NEAR-IR; PREFERENTIAL ORIENTATION; PREPARATION AND PROPERTIES; QUARTZ GLASS SUBSTRATES; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SUBSTRATE TEMPERATURE; THICKNESS OF THE FILM; TRANSMITTANCE SPECTRA; UV-VIS-NIR SPECTROPHOTOMETERS; WURTZITE STRUCTURE; X-RAY DIFFRACTOMETRY; XRD; ZNO; ZNO:MO (MZO) THIN FILM;

ELECTRIC PROPERTIES; FILM PREPARATION; MAGNETRON SPUTTERING; QUARTZ; REFRACTIVE INDEX; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE; ZINC SULFIDE;

OPTICAL FILMS;

EID: 79953031077     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.888246     Document Type: Conference Paper

References (8)

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