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Applied Surface Science

Volumn 257, Issue 14, 2011, Pages 6068-6072

Modification of surface properties of polyamide 6 films with atmospheric pressure plasma

(1) Gao, Zhiqiang a

a DEZHOU UNIVERSITY (China)

Author keywords

AFM; Atmospheric pressure plasma; Etching rate; Polyamide 6; T peel strength; XPS

Indexed keywords

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; ETCHING; PLASMA APPLICATIONS; SURFACE ROUGHNESS; WATER TREATMENT;

ATMOSPHERIC PRESSURE PLASMAS; ETCHING RATE; FLUORINE CONTENT; HYDROPHILIC GROUPS; POLYAMIDE 6; POLYMER SURFACE MODIFICATION; T-PEEL STRENGTH; WATER CONTACT ANGLE;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 79953025426 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.01.132 Document Type: Article

Times cited : (23)

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