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Volumn 253, Issue 9, 2007, Pages 4367-4373

RF-CF 4 plasma surface modification of paper: Chemical evaluation of two sidedness with XPS/ATR-FTIR

Author keywords

Etching; Film deposition; Paper; Plasma; Plasma surface interaction; Two sidedness

Indexed keywords

ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA APPLICATIONS; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33846815231     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.09.052     Document Type: Article
Times cited : (34)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.