RF plasma cleaning of the oxide surface as a possibility for contamination control in MOS structures

Vacuum

Volumn 51, Issue 3, 1998, Pages 469-472

  Alexandrova, S ^a   Szekeres, A ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346939994     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(98)00200-0     Document Type: Article

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