Nanostructure formation on silicon surfaces by high repetition-rate sub-15 femtosecond near-infrared laser pulses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7920, Issue , 2011, Pages

  Straub, Martin ^a   König, Karsten ^a  

^a SAARLAND UNIVERSITY   (Germany)

Author keywords

Carbon compound deposition; High numerical aperture objective; LIPSS; Si(100); Silicon dioxide particles; Sub 15 fs pulsed laser light; Surface ripples

Indexed keywords

CARBON COMPOUND DEPOSITION; HIGH-NUMERICAL APERTURE OBJECTIVE; LIPSS; SI(100); SILICON DIOXIDE PARTICLES; SUB-15 FS PULSED LASER LIGHT; SURFACE RIPPLES;

HYDROFLUORIC ACID; INFRARED DEVICES; INFRARED LASERS; MANUFACTURE; MICROELECTRONICS; POLARIZATION; PULSE REPETITION RATE; SILICA; SILICON; SILICON OXIDES;

PULSED LASERS;

EID: 79952998661     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.873596     Document Type: Conference Paper

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