Cleaning organized single-walled carbon nanotube interconnect structures for reduced interfacial contact resistance

Carbon

Volumn 49, Issue 7, 2011, Pages 2450-2458

  Kim, Young Lae ^a   Jung, Hyun Young ^a   Kar, Swastik ^b   Jung, Yung Joon ^a  

^a Northeastern University   (United States)

^b NORTHEASTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT ELECTRODES; INTERFACIAL CONTACT RESISTANCE; LOW-RESISTANCE CONTACTS; METAL ELECTRODES; NANOTUBE INTERCONNECT; PURIFICATION PROCEDURES; SINGLE-WALLED CARBON; TEMPERATURE RANGE; TEST STRUCTURE;

CLEANING; CONTACT RESISTANCE; ELECTRODES; METAL CLEANING;

SINGLE-WALLED CARBON NANOTUBES (SWCN);

EID: 79952990133     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2011.02.013     Document Type: Article

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