Mechanism of very lagrge scale assembly of SWNTs in template guided fluidic assembly process

Journal of the American Chemical Society

Volumn 131, Issue 2, 2009, Pages 804-808

  Jaber Ansari, Laila ^a   Hahm, Myung Gwan ^a   Somu, Sivasubramanian ^a   Sanz, Yolanda Echegoyen ^a   Busnaina, Ahmed ^a   Jung, Yung Joon ^a  

^a Northeastern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AQUEOUS SOLUTIONS; AR PLASMAS; CHEMICAL GROUP; DIP-COATING PROCESS; DIRECTED ASSEMBLY; FLUIDIC ASSEMBLY; NANO SCALE; PLASMA TREATMENT; SILICON OXIDE SURFACES; SINGLE-WALLED CARBON NANOTUBE NETWORKS; SURFACE CHARACTERIZATION; WAFER LEVEL;

ASSEMBLY; CARBON NANOTUBES; DANGLING BONDS; FUNCTIONAL GROUPS; PLASMA APPLICATIONS; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; SILICON WAFERS; SINGLE-WALLED CARBON NANOTUBES (SWCN);

SURFACE CHEMISTRY;

SINGLE WALLED NANOTUBE;

ARTICLE; HYDROPHILICITY; NANOANALYSIS; SURFACE PROPERTY;

EID: 67849096901     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja8076523     Document Type: Article

References (19)

1. Avouris. P.; Chen, Z.; Perebeinos. V. Nat. Nanotech. 2006, 2. 605615.
2. Portnoi, M. E.; Kibis, O. V.; Rosenau da Costa, M. Superlat. Microstruct. 2008, 43, 399-107.
3. Hayamizu, Y.; Yamada, T.; Mizuno, K.; Davis. R. C; Futaba, D. N.; Yumura, M.; Hata, K. Nat. Nanotech. 2008, 3, 289-294.
4. Suppiger, D.; Busato, S.; Ermanni, P. Carbon 2008, 46, 1085-1090.
5. Hierold, C.; Jungen, A.; Stampfer, C; Helbling, T. Sens. Actuators, A 2007, 136, 51-61.
6. Kang, J. W.; Lee, J. H.; Lee, H. J.; Hwang, H. J. Phys. E 2005, 27, 332-340.
7. Jung, Y. J.; Homma, Y.; Ogino, T.; Kobayashi, Y.; Takagi, D.; Wci, B. Q.; Vajtai, R.; Ajayan, P. M. J. Phys. Chem. B 2003, 107, 68596864.
8. Hata, K.; Futaba, D. N.; Mizuno, K.; Namai, T.; Yumura, M.; Iijima, S. Science 2004, 306, 1362-1364.
9. Wei, B. Q.; Vajtai, R.; Jung, Y.; Ward, J.; Zhang, R.; Ramanath, G.; Ajayan, P. M. Nature 2002, 416, 495-496.
10. Cascll, A. M.; Raymaskcrs, J. A.; Kong, J.; Dai, H. J. Phys. Chem. B 1999, 103, 6484-6492.
11. Lee. M.; Im, J.; Lee, B. Y.; Myung, S.; Kang, J.; Huang, L.; Kwon, Y.-K.; IIong, S. Nat. Nanotech. 2006, 1, 66-71.
12. Kamat, P. V.; Thomas, K. G.; Barazzouk, S.; Girishkumar, G.; Vinodgopal, K.; Meisel, D. J. Am. Chem. Soc 2004, 126, 1075710762.
13. Makaram, P.; Somu, S.; Xiong, X.; Busnaina, A.; Jung, Y. J.; McGruer, N. Appl. Phys. Lett. 2007, 90, 243108(1-3).
14. Makaram, P.; Selvarasah, S.; Xiong, X.; Chen, C.-L.; Busnaina, A.; Khanduja, N.; Dokmeci, M. R. Nanotechnology 2007, 18, 395204(15).
15. Xiong, X.; Jaber-Ansari, L.; Hahm, M, G.; Busnaina, A.; Jung, Y. J. Small 2007, 3, 2006-1010.
16. Murphy, D. V.; Brueck, S. R. J. Opt. Lett. 1983, 8, 494-196.
17. Zaidi, S. H.; Chu. A.; Brueck. S. R.; J., J.Appl. Phys. 1996, 80, 69977008.
18. Liu, F. M.; Ren, B.; Wu, J. H.; Yan, J. W.; Xue, X. F.; Mao, B. W.; Tian, Z. Q. Chem. Phys. Lett. 2003, 582, 502-507.
19. Brault, P.; Mathias, J.; Laure, C; Ranson, P.; Texier, O. J. Phys.: Condens. Matter 1994, 6, L1-L6.