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Volumn 25, Issue 27, 2009, Pages 139-145

Double-sided mesoporous silicon with embedded quasi-regular arranged ferromagnetic nanostructures fabricated by electrodeposition

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; ELECTRODES; FABRICATION; FERROMAGNETIC MATERIALS; FERROMAGNETISM; METALS; MORPHOLOGY; NANOCOMPOSITE FILMS; NANOSTRUCTURES; SILICON WAFERS; WET ETCHING;

EID: 79952751965     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3318512     Document Type: Conference Paper
Times cited : (6)

References (17)
  • 6
    • 0002306372 scopus 로고    scopus 로고
    • Impregnation of porous silicon
    • Ed. L. T. Canham, INSPEC, London
    • R. Herino, Impregnation of porous silicon in: Properties of porous silicon, Ed. L. T. Canham, INSPEC, London (1997).
    • (1997) Properties of Porous Silicon
    • Herino, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.