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Volumn 25, Issue 27, 2009, Pages 139-145
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Double-sided mesoporous silicon with embedded quasi-regular arranged ferromagnetic nanostructures fabricated by electrodeposition
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRODEPOSITION;
ELECTRODES;
FABRICATION;
FERROMAGNETIC MATERIALS;
FERROMAGNETISM;
METALS;
MORPHOLOGY;
NANOCOMPOSITE FILMS;
NANOSTRUCTURES;
SILICON WAFERS;
WET ETCHING;
DEPOSITION OF METALS;
FERROMAGNETIC NANOSTRUCTURES;
MESOPOROUS SILICON;
PORE DIAMETERS;
POROUS LAYERS;
POROUS STRUCTURES;
PULSED CURRENTS;
SPECIFIC DISTRIBUTION;
POROUS SILICON;
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EID: 79952751965
PISSN: 19385862
EISSN: 19386737
Source Type: Conference Proceeding
DOI: 10.1149/1.3318512 Document Type: Conference Paper |
Times cited : (6)
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References (17)
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