Electrodeposition of magnetic thin films of cobalt on silicon

Journal of Magnetism and Magnetic Materials

Volumn 226-230, Issue PART II, 2001, Pages 1613-1615

  Munford, M L ^a   Seligman, L ^a   Sartorelli, M L ^a   Voltolini, E ^a   Martins, L F O ^a   Schwarzacher, W ^b   Pasa, A A ^a  

^a FEDERAL UNIVERSITY OF SANTA CATARINA   (Brazil)

^b UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

Anisotropy; Coercivity thickness; Electrodeposition; Thin films magnetic

Indexed keywords

ANISOTROPY; COBALT; COERCIVE FORCE; ELECTRODEPOSITION; ELECTRODES; MAGNETIC THIN FILMS; MAGNETIZATION; SURFACE ROUGHNESS;

CO CONCENTRATIONS; DEPOSITED LAYER; IN-PLANE MAGNETIZATION; ION CONCENTRATIONS; LOW SURFACE ROUGHNESS; REMANENT MAGNETIZATION; TECHNOLOGICAL APPLICATIONS; THIN FILMS-MAGNETIC;

THIN FILMS;

EID: 34547166754     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(01)00082-8     Document Type: Article

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